The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 17, 2012
Filed:
Apr. 18, 2011
Eu Jin Lim, Sunnyvale, CA (US);
Adauto Diaz, Jr., Saratoga, CA (US);
Benjamin Schwarz, San Jose, CA (US);
James P. Cruse, Santa Cruz, CA (US);
Charles Hardy, San Jose, CA (US);
Eu Jin Lim, Sunnyvale, CA (US);
Adauto Diaz, Jr., Saratoga, CA (US);
Benjamin Schwarz, San Jose, CA (US);
James P. Cruse, Santa Cruz, CA (US);
Charles Hardy, San Jose, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
Methods for processing substrates in dual chamber processing systems comprising first and second process chambers that share resources may include performing a first internal chamber clean in each of the first process chamber and the second process chamber; and subsequently processing a substrate in one of the first process chamber or the second process chamber by: providing a substrate to one of the first process chamber or the second process chamber; providing a process gas to the first process chamber and the second process chamber; forming a plasma in only the one of the first process chamber or the second process chamber having the substrate contained therein; and providing an inert gas to the first process chamber and the second process chamber via one or more channels formed in a surface of respective substrate supports disposed in the first process chamber and the second process chamber while processing the substrate.