The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 17, 2012
Filed:
Jul. 02, 2007
Hideki Kawai, Kobe, JP;
Hideki Kawai, Kobe, JP;
Konica Minolta Opto, Inc., Tokyo, JP;
Abstract
A method for fabricating a glass substrate containing SiOas a main ingredient thereof and having a uniform and minute pattern of stripes formed on the surface thereof by ultraprecision polishing includes a step of inspecting whether or not, at the topmost surface portion of the glass substrate after polishing, a given property of a bound energy of the Si atom with respect to the electrons occupying a 2P orbit as determined by XPS is equal to or less than a predetermined value, and the given property is a shift amount of the bound energy or a half-value width of the bound energy distribution, the predetermined value is 0.10 eV or 2.15 eV, respectively.