The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 10, 2012
Filed:
Mar. 31, 2009
Daniel Qi Tan, Rexford, NY (US);
Patricia Chapman Irwin, Altamont, NY (US);
George Theodore Dalakos, Niskayuna, NY (US);
Yang Cao, Niskayuna, NY (US);
Daniel Qi Tan, Rexford, NY (US);
Patricia Chapman Irwin, Altamont, NY (US);
George Theodore Dalakos, Niskayuna, NY (US);
Yang Cao, Niskayuna, NY (US);
General Electric Company, Niskayuna, NY (US);
Abstract
In one aspect of the present invention, a method for increasing the dielectric breakdown strength of a polymer is described. The method comprises providing the polymer and contacting a surface of the polymer in a reaction chamber with a gas plasma, under specified plasma conditions. The polymer is selected from the group consisting of a polymer having a glass transition temperature of at least about 150° C., and a polymer composite comprising at least one inorganic constituent. The contact with the gas plasma is carried out for a period of time sufficient to incorporate additional chemical functionality into a surface region of the polymer film, to provide a treated polymer. Also provided are an article and method of manufacture.