The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 10, 2012
Filed:
Nov. 29, 2006
Karen D. Hendrix, Santa Rosa, CA (US);
Kim L. Tan, Santa Rosa, CA (US);
Charles A. Hulse, Sebastopol, CA (US);
Robert B. Sargent, Santa Rosa, CA (US);
Robert E. Klinger, Winchester, CA (US);
Karen D. Hendrix, Santa Rosa, CA (US);
Kim L. Tan, Santa Rosa, CA (US);
Charles A. Hulse, Sebastopol, CA (US);
Robert B. Sargent, Santa Rosa, CA (US);
Robert E. Klinger, Winchester, CA (US);
JDS Uniphase Corporation, Milpitas, CA (US);
Abstract
An oblique angle deposition is used to provide an A-plate optical retarder having at least one dense, form-birefringent layer. According to one embodiment, the dense, form-birefringent layer(s) are deposited as part of an FBAR stack to provide an all-dielectric full-function A/−C-plate trim retarder for LCD birefringence compensation. Advantageously, the dense structure of the full-function A/−C-plate trim retarder offers high durability and/or stability, thus making it well suited for providing polarization compensation in high light flux polarization-based projection systems.