The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 10, 2012
Filed:
Sep. 20, 2006
Tomoki Masuda, Osaka, JP;
Toshihiro Higuchi, Osaka, JP;
Yasuo Takeuchi, Osaka, JP;
Tomoko Komatsu, Kyoto, JP;
Tomoki Masuda, Osaka, JP;
Toshihiro Higuchi, Osaka, JP;
Yasuo Takeuchi, Osaka, JP;
Tomoko Komatsu, Kyoto, JP;
Panasonic Corporation, Osaka, JP;
Abstract
Provided is a manufacturing method of a solid-state imaging device, which is able to realize a solid-state imaging device whose reflection prevention coating is even and that does not have image noise in case of adopting a spincoating method in applying a material of the reflection prevention coating onto microlenses of the solid-state imaging device. In the solid-state imaging deviceaccording to the present invention, a barrier wall patternis formed, as a step alleviating structure, in dicing areasX formed between adjacent imaging areas. The barrier wall patternhas a rectangular sectional form. With use of the barrier wall patternin the spincoating method, reflection prevention coatingis coated onto the microlensesmore evenly than in conventional cases.