The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 10, 2012

Filed:

Dec. 03, 2002
Applicants:

Akira Fujisawa, Osaka, JP;

Yukio Sueyoshi, Osaka, JP;

Masahiro Hirata, Osaka, JP;

Toru Yamamoto, Osaka, JP;

Koichiro Kiyohara, Osaka, JP;

Kiyotaka Ichiki, Osaka, JP;

Inventors:

Akira Fujisawa, Osaka, JP;

Yukio Sueyoshi, Osaka, JP;

Masahiro Hirata, Osaka, JP;

Toru Yamamoto, Osaka, JP;

Koichiro Kiyohara, Osaka, JP;

Kiyotaka Ichiki, Osaka, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 31/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

The present invention provides a thin film-forming method by which, even when a thin film containing a crystalline metal oxide as the main component is formed over a wide area within a short time utilizing a thermal decomposition method, the thickness of the thin film becomes relatively uniform. A thin film-forming method of the present invention includes forming a thin film using a raw material containing a chloride of a metal, and prior to the forming of the thin film, 1) disposing metal-containing particles on the substrate, or 2) forming, at a film deposition rate slower than a film deposition rate for the thin film, a metal-containing thin film on the substrate, and wherein, in the case of the step 2), the thin film containing the metal oxide as the main component is directly formed on the metal-containing thin film.


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