The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 10, 2012

Filed:

Jan. 30, 2009
Applicants:

Joe Shuler, League City, TX (US);

Jose Sosa, Deer Park, TX (US);

Inventors:

Joe Shuler, League City, TX (US);

Jose Sosa, Deer Park, TX (US);

Assignee:

Fina Technology, Inc., Houston, TX (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08J 9/02 (2006.01); C08K 5/00 (2006.01); C08F 297/00 (2006.01); C08L 25/04 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method comprising contacting a first styrenic polymer composition comprising residual styrene monomer with a molecular sieve, and recovering a second styrenic polymer composition comprising a reduced amount of residual styrene monomer. A composition comprising a styrenic polymer having a residual styrene monomer amount of less than 100 ppm produced by contacting a styrenic polymer composition having a residual styrene monomer amount of equal to or greater than 100 ppm with a molecular sieve, and recovering the styrenic polymer having a residual styrene monomer amount of less than 100 ppm. A method comprising providing a styrenic polymer composition having a residual styrene monomer amount of equal to or greater than 100 ppm, contacting the styrenic polymer composition with a molecular sieve, adding a nucleating agent, a foaming agent, and a coloring agent to the styrenic polymer composition, and forming an expanded styrenic polymer composition having a residual styrene monomer amount of less than 100 ppm.


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