The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 10, 2012
Filed:
Aug. 26, 2010
Akio Koike, Tokyo, JP;
Yasutomi Iwahashi, Tokyo, JP;
Shinya Kikugawa, Tokyo, JP;
Yuko Tachibana, Tokyo, JP;
Akio Koike, Tokyo, JP;
Yasutomi Iwahashi, Tokyo, JP;
Shinya Kikugawa, Tokyo, JP;
Yuko Tachibana, Tokyo, JP;
Asahi Glass Company, Limited, Tokyo, JP;
Abstract
The present invention provides a TiO—SiOglass in which when used as an optical member for an exposure tool for EUVL, a thermal expansion coefficient is substantially zero at the time of irradiation with high-EUV energy light, and physical properties of a multilayer can be kept over a long period of time by releasing hydrogen from the glass. The present invention relates to a TiO-containing silica glass having a fictive temperature of 1,100° C. or lower, a hydrogen molecule concentration of 1×10molecules/cmor more, and a temperature, at which a linear thermal expansion coefficient is 0 ppb/° C., falling within the range of from 40 to 110° C.