The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 10, 2012
Filed:
Dec. 29, 2008
Hoon Kang, Suwon-si, KR;
Jae-sung Kim, Yongin-si, KR;
Yang-ho Jung, Yongin-si, KR;
Hi-kuk Lee, Yongin-si, KR;
Yasuhiro Kameyama, Yokohama, JP;
Yuuji Mizuho, Yokohama, JP;
Jong-cheol Kim, Suwon-si, KR;
Se-jin Choi, Yongin-si, KR;
Hoon Kang, Suwon-si, KR;
Jae-Sung Kim, Yongin-si, KR;
Yang-Ho Jung, Yongin-si, KR;
Hi-Kuk Lee, Yongin-si, KR;
Yasuhiro Kameyama, Yokohama, JP;
Yuuji Mizuho, Yokohama, JP;
Jong-Cheol Kim, Suwon-si, KR;
Se-Jin Choi, Yongin-si, KR;
Samsung Electronics Co., Ltd., , KR;
Techno Semichem Co., Ltd., , KR;
Abstract
A negative photoresist composition and a method of manufacturing an array substrate. The negative photoresist composition includes a photocurable composition including an ethylene unsaturated compound containing an ethylene unsaturated bond and a photopolymerization initiator, a thermosetting composition including an alkali-soluble resin crosslinked by heat and an organic solvent. The negative photoresist composition improves stability, photosensitivity, detachability after performing a developing operation and reduces residue to improve the reliability of an organic insulation layer. Furthermore, the negative photoresist composition improves the transmittance of an organic insulation layer and reduces the variation of color coordinates to improve the display quality of a display apparatus.