The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 10, 2012
Filed:
Mar. 06, 2008
Applicant:
Kazuyoshi Mizutani, Shizuoka, JP;
Inventor:
Kazuyoshi Mizutani, Shizuoka, JP;
Assignee:
Fujifilm Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/039 (2006.01); G03F 7/028 (2006.01); C08F 12/26 (2006.01); C08F 12/30 (2006.01);
U.S. Cl.
CPC ...
Abstract
A positive resist composition, includes: (A) a resin having a repeating unit represented by formula (A) as defined in the specification, which decomposes under an action of an acid to increase a solubility of the resin (A) in an alkali developer; and a pattern forming method uses the composition.
Mizutani, Kazuyoshi. (2012). Positive resist composition and pattern forming method using the same (U.S. Patent No. 8092977). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8092977
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile