The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 10, 2012

Filed:

Jun. 28, 2004
Applicants:

Shigenobu Yoshida, Tokyo, JP;

Tooru Hachisuka, Tokyo, JP;

Chiharu Okawara, Tokyo, JP;

Inventors:

Shigenobu Yoshida, Tokyo, JP;

Tooru Hachisuka, Tokyo, JP;

Chiharu Okawara, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B32B 27/30 (2006.01); B32B 27/32 (2006.01); B32B 27/34 (2006.01); B32B 27/36 (2006.01); B32B 27/40 (2006.01);
U.S. Cl.
CPC ...
Abstract

A gas-barrier laminate comprises a plastic substrate (A), an inorganic thin film (B) formed on at least one surface of the plastic substrate (A), and a polyester-based resin layer (C) formed by applying a coating material containing a polyester-based resin on a surface of the inorganic thin film (B), wherein the polyester-based resin has a glass transition temperature of 50 to 70° C., a molecular weight of 1500 to 15000 and a hydroxyl value of 10 to 60 mg KOH/g, and the gas-barrier laminate has an oxygen permeability of not more than 5 cc/m/day/atm and a water vapor permeability of not more than 5 g/m/day. The gas-barrier laminate of the present invention is excellent in printability (in particular, gradation printability), is free from deterioration in gas-barrier property, namely is excellent in gas-barrier property, even after providing a printed layer thereon, and further exhibits an excellent adhesion between the plastic substrate (A) and the inorganic thin film (B) even after being subjected to retort treatments.


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