The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 10, 2012
Filed:
Jul. 10, 2007
Piero Sferlazzo, Marblehead, MA (US);
Alexander I. Gurary, Brigdewater, NJ (US);
Eric A. Armour, Pennington, NJ (US);
William E. Quinn, Whitehouse Station, NJ (US);
Steve Ting, Whitehouse Station, NJ (US);
Piero Sferlazzo, Marblehead, MA (US);
Alexander I. Gurary, Brigdewater, NJ (US);
Eric A. Armour, Pennington, NJ (US);
William E. Quinn, Whitehouse Station, NJ (US);
Steve Ting, Whitehouse Station, NJ (US);
Veeco Instruments Inc., Plainview, NY (US);
Abstract
A system and method for uniform deposition of material layers on wafers in a rotating disk chemical vapor deposition reaction system is provided, wherein one or more substrates are rotated on a carrier about an axis while maintaining surfaces of the one or more substrates substantially perpendicular to the axis of rotation and facing in an upstream direction along the axis of rotation. During rotating a first gas is discharged in the downstream direction towards the one or more substrates from a first set of gas inlets. A second gas is discharged in the downstream direction towards the one or more substrates from at least one movable gas injector, and the at least one movable gas inlet is moved with a component of motion in a radial direction towards or away from the axis of rotation.