The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 10, 2012

Filed:

Mar. 30, 2009
Applicants:

Maher I. Boulos, Sherbrooke, CA;

Jiayin Guo, Sherbrooke, CA;

Jerzy Jurewicz, Sherbrooke, CA;

Gang Han, Tottori, JP;

Shujiroh Uesaka, Shimane, JP;

Hiroshi Takashima, Tottori, JP;

Inventors:

Maher I. Boulos, Sherbrooke, CA;

Jiayin Guo, Sherbrooke, CA;

Jerzy Jurewicz, Sherbrooke, CA;

Gang Han, Tottori, JP;

Shujiroh Uesaka, Shimane, JP;

Hiroshi Takashima, Tottori, JP;

Assignees:

Hitachi Metals, Ltd., Tokyo, JP;

Tekna Plasma Systems Inc., Sherbrooke, CA;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C22B 34/12 (2006.01);
U.S. Cl.
CPC ...
Abstract

A process and apparatus for producing titanium metal is described herein. The process comprises generating an RF thermal plasma discharge using a plasma torch provided with an RF coil; reducing titanium tetrachloride to a titanium metal by supplying titanium tetrachloride and magnesium into the RF thermal plasma discharge; and collecting or depositing the titanium metal at a temperature not lower than the boiling point of magnesium chloride and not higher than the boiling point of the titanium metal.


Find Patent Forward Citations

Loading…