The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 03, 2012
Filed:
Jun. 17, 2006
Ion Vizireanu, Westlake Village, CA (US);
Yousef Wasef Nijim, Valencia, CA (US);
Mike Arthur Derrenberger, Hopkinton, MA (US);
Ion Vizireanu, Westlake Village, CA (US);
Yousef Wasef Nijim, Valencia, CA (US);
Mike Arthur Derrenberger, Hopkinton, MA (US);
Thomson Licensing, Boulogne-Billancourt, FR;
Abstract
A system and method for analyzing and marking a film image for providing a marked film with robust marks which have a high survival rate during, e.g., unauthorized duplication. The present invention provides the ability to facilitate the choosing of ideal locations of marks for marking a film image by recommending potential marking locations based on the survivability of the mark against different background colors. The system and method provides for selecting at least two potential marking areas in at least one frame of the film, saturating the at least two potential marking areas in a predetermined color of a mark, calculating a root mean square error (RMSE) of each of the at least two potential marking areas and an area surrounding each potential marking area, and determining which of the at least two potential marking areas has the lowest RMSE, i.e., the recommend marking location.