The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 03, 2012

Filed:

Jun. 05, 2008
Applicants:

Takeyuki Mizutani, Kumagaya, JP;

Yuichi Shibazaki, Kumagaya, JP;

Makoto Shibuta, Kumagaya, JP;

Inventors:

Takeyuki Mizutani, Kumagaya, JP;

Yuichi Shibazaki, Kumagaya, JP;

Makoto Shibuta, Kumagaya, JP;

Assignee:

Nikon Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B23B 5/34 (2006.01); G03B 27/32 (2006.01); G03B 27/42 (2006.01); G03B 27/52 (2006.01); G03B 27/58 (2006.01); G03B 27/60 (2006.01);
U.S. Cl.
CPC ...
Abstract

A substrate holding apparatus includes a base part and a support part that is formed on the base part and supports a rear surface of the substrate. A first circumferential wall is formed on the base part, has a first upper surface that opposes the rear surface of the substrate, which is supported by the support part, and surrounds a first space that is between the substrate, which is supported by the support and the base part. A second circumferential wall is formed on the base part, has a second upper surface that opposes the rear surface of the substrate, which is supported by the support part, with a gap interposed therebetween, and surrounds the first circumferential wall. A third circumferential wall is formed on the base part, has a third upper surface that opposes the rear surface of the substrate, which is supported by the support part; and surrounds the support part and the second circumferential wall. A fluid flow port is capable of supplying gas to a second space that is between the first circumferential wall and the second circumferential wall. A first suction port suctions fluid from a third space that is between the second circumferential wall and the third circumferential wall.


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