The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 03, 2012
Filed:
Apr. 18, 2007
Shuji Nagano, Tsuchiura, JP;
Satoshi Hasaka, Oyama, JP;
Minoru Inoue, Tokyo, JP;
Toshinori Shibata, Tsukuba, JP;
Shuji Nagano, Tsuchiura, JP;
Satoshi Hasaka, Oyama, JP;
Minoru Inoue, Tokyo, JP;
Toshinori Shibata, Tsukuba, JP;
Taiyo Nippon Sanso Corporation, Tokyo, JP;
Abstract
The present invention provides a method of remedying deterioration of an insulating film which, during the remedial treatment of an insulating film deteriorated by plasma treatment, does not leave residual remedial agent on the wiring material such as the copper wiring layer, can be conducted using a dry process, and exhibits excellent applicability to mass production. The insulating film that has been deteriorated by plasma treatment is brought into contact with a remedial agent composed of a compound with a molecular structure having at least one of a nitro group and a carbonyl group, and at least one of a hydrocarbon group and a hydrogen group.