The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 03, 2012

Filed:

Nov. 10, 2008
Applicants:

Min Su Kim, Ulsan, KR;

Jong Seo Park, Gyeongsangnam-do, KR;

Inventors:

Min Su Kim, Ulsan, KR;

Jong Seo Park, Gyeongsangnam-do, KR;

Assignees:

Hyundai Motor Company, Seoul, KR;

Moltex-Yangsan Co., Ltd., Gyeongsangnam-do, KR;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C25D 1/00 (2006.01); B23P 15/00 (2006.01); B29C 33/40 (2006.01);
U.S. Cl.
CPC ...
Abstract

The present invention provides a method of fabricating a mask for forming wood grain patterns, the method comprising: subjecting a metal plate to an etching process to process a selected pattern on the metal plate; producing a pattern sheet using the etched metal plate an a flexible sheet; attaching the produced pattern sheet to the surface of a product; and subjecting the product to an electroforming process to thereby fabricate the mask. With the method, the time and cost for production of the mask can be remarkably reduced.


Find Patent Forward Citations

Kim, Min. (2012). Method of fabricating mask for forming wood grain patterns (U.S. Patent No. 8088268). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8088268

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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