The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 03, 2012
Filed:
Feb. 17, 2009
Kazunori Takahashi, Ashigarakami-gun, JP;
Kazunori Takahashi, Ashigarakami-gun, JP;
Fujifilm Corporation, Tokyo, JP;
Abstract
A diffusion reaction method includes: joining a plurality of reaction liquids relating to a reaction to form a multilayer flow; sandwiching from both sides of the multilayer flow in the depthwise direction using sandwiching liquid so that the multilayer flow is contracted and thinned; and flowing the multilayer flow through a reaction channel to cause a diffusive mixing between laminar flows so as to cause the reaction. The method enables to allow reacting diffusive mixing a plurality of reaction liquids instantly in a reaction channel, is suitable for any kinds of reaction product. Further, for example, when forming fine particles in a diffusion reaction, the method can prevent logging of the reaction channel by the fine particles and an adhesion of the fine particles to the wall of the reaction channel.