The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 03, 2012

Filed:

Jun. 14, 2007
Applicants:

Patrick Griss, Otelfingen, CH;

Marzellinus Zipfel, Freiburg, DE;

Angel Lopez, Pforzheim, DE;

Inventors:

Patrick Griss, Otelfingen, CH;

Marzellinus Zipfel, Freiburg, DE;

Angel Lopez, Pforzheim, DE;

Assignee:

Roche Diagnostics Operations, Inc., Indianapolis, IN (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B21D 53/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

The sheet metal or substrate materialis constructed by a photo-chemical machining or milling method. In this exemplary process, an etching maskis applied to both sides of the substrateand covers the structure of the flat-shaped member, which is to be uncovered in a subsequent etching step. The maskis formed by coating the substratewith a photoresist and is exposed through a photomask having the desired pattern that is arranged in front of the mask, whereby the photoresist is polymerized or hardened in the covered areas while the other areas are rinsed away after development.


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