The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 27, 2011

Filed:

Jul. 07, 2004
Applicants:

Michael Plotkin, Rehovot, IL;

Haim Livne, Kfar Saba, IL;

Shlomo Harush, Nes Ziona, IL;

Inventors:

Michael Plotkin, Rehovot, IL;

Haim Livne, Kfar Saba, IL;

Shlomo Harush, Nes Ziona, IL;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06T 5/00 (2006.01); H04N 1/407 (2006.01); H04N 1/409 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method of determining presence of variations in interline spacing in a first image comprising a first plurality of parallel lines of pixels comprising: providing a second image comprising a second plurality of parallel lines; orienting the images so that the lines in the first and second pluralities are superimposed and angled with respect to each other to generate an interference image comprising a Moiré interference pattern; and using the Moiré interference pattern to determine presence of said variations.


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