The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 27, 2011
Filed:
Aug. 01, 2008
Applicants:
Katsuhiro Yamashita, Shizuoka, JP;
Yasutomo Kawanishi, Kanagawa, JP;
Inventors:
Katsuhiro Yamashita, Shizuoka, JP;
Yasutomo Kawanishi, Kanagawa, JP;
Assignee:
Fujifilm Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/039 (2006.01); G03F 7/20 (2006.01); G03F 7/30 (2006.01);
U.S. Cl.
CPC ...
Abstract
A positive resist composition for electron beam, X-ray or EUV includes (A) a compound represented by the following formula (I), and (B) a resin capable of decomposing by the action of an acid to increase solubility in an alkali developing solution, which includes a repeating unit represented by the following formula (II) and a repeating unit represented by the following formula (III):
Quick Actions:
Yamashita, Katsuhiro. (2011). Resist composition for electron beam, x-ray, or euv, and pattern-forming method using the same (U.S. Patent No. 8084183). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8084183
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile