The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 27, 2011
Filed:
Apr. 03, 2007
Gerardo A. Delgadino, Santa Clara, CA (US);
Indrajit Lahiri, Santa Clara, CA (US);
Teh-tien Su, Milpitas, CA (US);
Sy-yuan Brian Shieh, Palo Alto, CA (US);
Ashok Sinha, Los Altos Hills, CA (US);
Gerardo A. Delgadino, Santa Clara, CA (US);
Indrajit Lahiri, Santa Clara, CA (US);
Teh-Tien Su, Milpitas, CA (US);
Sy-Yuan Brian Shieh, Palo Alto, CA (US);
Ashok Sinha, Los Altos Hills, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A substrate is processed in a process chamber comprising a substrate support having a receiving surface for receiving a substrate so that a front surface of the substrate is exposed within the chamber. An energized process gas is used to process the front surface of the substrate. A peripheral edge of the backside surface of the substrate is cleaned by raising the substrate above the receiving surface of the substrate support to a raised position, and exposing the backside surface of the substrate to an energized cleaning gas.