The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 27, 2011

Filed:

Jul. 11, 2008
Applicants:

Donn Nathan Boatman, Union, KY (US);

Kevin Benson Mcneil, Loveland, OH (US);

David Mark Rasch, Cincinnati, OH (US);

Kevin Mitchell Wiwi, West Chester, OH (US);

Wayne Robert Fisher, Cincinnati, OH (US);

Inventors:

Donn Nathan Boatman, Union, KY (US);

Kevin Benson McNeil, Loveland, OH (US);

David Mark Rasch, Cincinnati, OH (US);

Kevin Mitchell Wiwi, West Chester, OH (US);

Wayne Robert Fisher, Cincinnati, OH (US);

Assignee:

The Procter & Gamble Company, Cincinnati, OH (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
D21H 27/02 (2006.01); D21H 27/40 (2006.01); B31F 1/07 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method for producing a deep-nested embossed product is disclosed. The method comprises the steps of: a) providing an embossing apparatus having mating first and second embossing members; b) providing the first embossing member with a plurality of discrete embossing elements in a non-random pattern; c) providing the second embossing member with at least one linear embossing element; d) coordinating the at least one linear embossing element with the non-random pattern of first embossing elements; e) aligning the first embossing member and the second embossing member so that the non-random pattern of first embossing elements nest with the at least one linear embossing element to an engagement depth of greater than about 0.01 mm; f) providing one or more plies of material to the embossing apparatus; and, g) passing the one or more plies of the material between the first and second embossing members to produce the deep-nested embossed product.


Find Patent Forward Citations

Loading…