The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 27, 2011

Filed:

May. 15, 2007
Applicants:

Allen J. Bartlett, New London, NH (US);

Joseph A. Kraus, Pepperell, MA (US);

Michael J. Eacobacci, Jr., South Attleboro, MA (US);

Inventors:

Allen J. Bartlett, New London, NH (US);

Joseph A. Kraus, Pepperell, MA (US);

Michael J. Eacobacci, Jr., South Attleboro, MA (US);

Assignee:

Brooks Automation, Inc., Chelmsford, MA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
F17C 13/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A cluster tool has a transfer chamber, and a load lock chamber. An adaptor is configured to be coupled between the transfer chamber and the load lock chamber. The adaptor has an adaptor housing with an interior space including an entrance with a first valve and an exit with a second valve. The adaptor housing forms a substrate path through the interior space. The first valve connects the interior space and the load lock chamber. The second valve connects the interior space and the transfer chamber. A cryogenic surface is associated with the adaptor. Other pumps can be associated with the adaptor, such as, for example, a turbo pump, or water vapor pump. The cryogenic surface is configured to selectively evacuate the interior space. A wafer is adapted to be moved through the first valve and through the adaptor housing along the path. The wafer is moved through the exit and into the transfer chamber once the second valve is opened. This adaptor can be applied to the process chamber as well as the load lock.


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