The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 8081317 B1

PDF
Full Text
Expired
Date of Patent:
Dec. 20, 2011

Filed:

May. 06, 2009
Applicants:

Gerhard Kalkowski, Jena, DE;

Olaf Stenzel, Bucha, DE;

Wieland Stöckl, Jena, DE;

Inventors:

Gerhard Kalkowski, Jena, DE;

Olaf Stenzel, Bucha, DE;

Wieland Stöckl, Jena, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B 11/02 (2006.01); F23Q 3/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

The embodiments disclosed herein relate to an electrostatic chuck, or an optically structured element or an optical mask that comprise a metal film as well as a transparent cover applied on a substrate. At least two anti-reflective films are inserted between the metal film and the cover that reduce the reflectance of the metal film, as viewed from the surface, to almost zero. As a result, a direct interferometer measurement of the surface structure of the transparent cover is possible. Methods of measurement and of use are also disclosed.


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