The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 20, 2011
Filed:
Jul. 03, 2008
Kyung-ic Jang, Daejeon, KR;
Kyung-hwan YE, Gyeonggi-do, KR;
Sam-woong Kim, Gyeonggi-do, KR;
Yong-sup Reim, Gyeonggi-do, KR;
Kyung-Ic Jang, Daejeon, KR;
Kyung-Hwan Ye, Gyeonggi-do, KR;
Sam-Woong Kim, Gyeonggi-do, KR;
Yong-Sup Reim, Gyeonggi-do, KR;
Komico Ltd., , KR;
Abstract
An ion implanter includes a process chamber and a coating layer. The process chamber receives a substrate and provides a space to perform an ion implantation process on the substrate. The coating layer is disposed on an inner wall of the process chamber to reduce contamination of the substrate and includes the same material as that of the substrate.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile