The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 20, 2011
Filed:
Nov. 29, 2005
Kishan Dholakia, Glasgow, GB;
Christian Thomas Alcuin Brown, Glasgow, GB;
Lynn Paterson, Glasgow, GB;
Kishan Dholakia, Glasgow, GB;
Christian Thomas Alcuin Brown, Glasgow, GB;
Lynn Paterson, Glasgow, GB;
The University of Court of the University of St. Andrews, St. Andrews, GB;
Abstract
An opening is formed in a cell using laser radiation. A Bessel beam is formed using the laser radiation and the Bessel beam is directed onto the cell to form an opening. The guiding of material towards the opening may be involved using optical trapping/manipulation. The material may change cellular function or analyse cell behaviour. Both pulsed laser radiation and continuous wave radiation may be formed using the same laser.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile