The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 20, 2011
Filed:
Feb. 20, 2009
Hisayoshi Watanabe, Tokyo, JP;
Toshiomi Yokoyama, Tokyo, JP;
Nobuyuki Mori, Tokyo, JP;
Akihiro Kaneko, Tokyo, JP;
Michitaka Nishiyama, Tokyo, JP;
Kenji Yokoyama, Tokyo, JP;
Hisayoshi Watanabe, Tokyo, JP;
Toshiomi Yokoyama, Tokyo, JP;
Nobuyuki Mori, Tokyo, JP;
Akihiro Kaneko, Tokyo, JP;
Michitaka Nishiyama, Tokyo, JP;
Kenji Yokoyama, Tokyo, JP;
TDK Corporation, Tokyo, JP;
Abstract
The present invention relates to a shaping method of a thin film layer and a manufacturing method of a perpendicular recording magnetic head using the same. In the thin film layer shaping method according to the present invention, since a second thin film of a lower etching rate is etched by a preliminary etching amount allowing for a difference between the etching rate of the second thin film and an etching rate of a first thin film in side-by-side relationship with each other, both the first and second thin films can be etched by the same etching amount through a subsequent etching step, so that the thin film layer can be shaped into a given shape. Thus, the surface of the thin film layer can be planarized.