The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 20, 2011
Filed:
Mar. 28, 2008
Shinya Mochizuki, Utsunomiya, JP;
Takashi Kamono, Utsunomiya, JP;
Shinya Mochizuki, Utsunomiya, JP;
Takashi Kamono, Utsunomiya, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
A processing apparatus configured to process a substrate under a vacuum environment includes a holding unit configured to hold the substrate, a dust collection part having a surface opposite to the substrate held by the holding unit, a vacuum chamber configured to accommodate the holding unit and to have an internal space that can be decompressed, a temperature controlling unit configured to control a temperature of the surface of the dust collection part opposite to the substrate to a temperature lower than a temperature of the substrate, and a driving unit configured to bring one of the holding unit and the dust collection part close to the other after the temperature controlling unit controls the temperature of the surface of the dust collection part opposite to the substrate.