The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 20, 2011
Filed:
Dec. 13, 2007
Yong Shen, Saratoga, CA (US);
Liubo Hong, San Jose, CA (US);
Guanghong Luo, Fremont, CA (US);
Honglin Zhu, Fremont, CA (US);
Lei Wang, Fremont, CA (US);
Yingjian Chen, Fremont, CA (US);
Yong Shen, Saratoga, CA (US);
Liubo Hong, San Jose, CA (US);
Guanghong Luo, Fremont, CA (US);
Honglin Zhu, Fremont, CA (US);
Lei Wang, Fremont, CA (US);
Yingjian Chen, Fremont, CA (US);
Western Digital (Fremont), LLC, Fremont, CA (US);
Abstract
A method for providing a perpendicular magnetic recording (PMR) transducer is described. The PMR transducer provided includes a PMR pole and yoke structure coupled with the PMR pole. The method includes providing a hard mask and an intermediate layer. A first portion of the hard mask resides on the PMR pole. A second portion of the hard mask resides on another structure. The intermediate layer surrounds at least the PMR pole. The method also includes performing a planarization on at least the intermediate layer, removing the first portion of the hard mask on the PMR pole without completely removing the second portion of the hard mask on the other structure. The method further includes removing a remaining portion of the hard mask on the other structure, providing a write gap on the PMR pole, and providing a shield on the write gap.