The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 13, 2011

Filed:

Mar. 09, 2007
Applicants:

Lauren Lavoie, Seattle, WA (US);

David P. Relyea, Bellevue, WA (US);

Ashish S. Shetty, Bothell, WA (US);

Weibing Zhan, Sammamish, WA (US);

Inventors:

Lauren Lavoie, Seattle, WA (US);

David P. Relyea, Bellevue, WA (US);

Ashish S. Shetty, Bothell, WA (US);

WeiBing Zhan, Sammamish, WA (US);

Assignee:

Microsoft Corporation, Redmond, WA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06F 3/038 (2006.01);
U.S. Cl.
CPC ...
Abstract

Various technologies and techniques are disclosed that allow a user interface in a managed runtime environment to display content from two or more different partitioned process spaces. A software application having a user interface operates a managed runtime environment. A window handle allows a user interface of the application to display content from different partitioned process spaces at a same time. Information from the partitioned process spaces can be integrated within the user interface while preserving a level of isolation between the partitioned process spaces. This is accomplished by providing a first portion of a content container for the user interface with a host control that contains the window handle and resides in a first partitioned process space of a main window. A second portion of the content container is provided with a source control that provides the window handle and resides in a second partitioned process space.


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