The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 13, 2011
Filed:
Sep. 28, 2007
Applicants:
Real Vallee, Quebec, CA;
Martin Bernier, Quebec, CA;
Dominic Faucher, Quebec, CA;
Inventors:
Assignee:
Universite Laval, Quebec, CA;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 6/34 (2006.01);
U.S. Cl.
CPC ...
Abstract
A system and method for permanently writing diffraction gratings in low phonon energy glass waveguides are shown. Ultrashort light pulses are generated and made to form two beams synchronously superimposed in the waveguide, therefore forming an interference pattern corresponding to the desired grating. The light pulses are focussed so that the light intensity in the waveguide exceeds a filamentation threshold. The exposure of the waveguide to these light pulses is controlled temporally and spatially in order to limit detrimental thermal effects induced by the high-intensity pulses in the glass medium of the waveguide.