The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 13, 2011
Filed:
Mar. 22, 2007
Richard E. Demaray, Portola Valley, CA (US);
Hong Mei Zhang, San Jose, CA (US);
Mukundan Narasimhan, San Jose, CA (US);
Vassiliki Milonopoulou, San Jose, CA (US);
Richard E. Demaray, Portola Valley, CA (US);
Hong Mei Zhang, San Jose, CA (US);
Mukundan Narasimhan, San Jose, CA (US);
Vassiliki Milonopoulou, San Jose, CA (US);
SpringWorks, LLC, Minnetonka, MN (US);
Abstract
High density oxide films are deposited by a pulsed-DC, biased, reactive sputtering process from a titanium containing target to form high quality titanium containing oxide films. A method of forming a titanium based layer or film according to the present invention includes depositing a layer of titanium containing oxide by pulsed-DC, biased reactive sputtering process on a substrate. In some embodiments, the layer is TiO. In some embodiments, the layer is a sub-oxide of Titanium. In some embodiments, the layer is TiOwherein x is between about 1 and about 4 and y is between about 1 and about 7. In some embodiments, the layer can be doped with one or more rare-earth ions. Such layers are useful in energy and charge storage, and energy conversion technologies.