The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 13, 2011
Filed:
Feb. 16, 2006
Seiji Mishima, Yamato, JP;
Seiji Mishima, Yamato, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
In case of forming films in plural positions with an ink jet head having plural nozzles, to provide a method of efficiently correcting an aberration in the liquid droplet applying position resulting for example from a distortion of a substrate, thereby producing an electron source with a high production yield. Positions of device electrodeson the electron source substrateare detected by fetching in advance a surface image of the substrate, then a position of an electroconductive filmis calculated as a liquid droplet applying position, and an inclination angle θ of the ink jet headis so regulated that a pitch of the nozzlesmatches a pitch d of the obtained liquid droplet applying positions.