The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 06, 2011
Filed:
Mar. 01, 2010
Applicants:
Lars Markwort, Haimhausen, DE;
Rajeshwar Chhibber, San Jose, CA (US);
Klaus Eckerl, Hutthurm, DE;
Norbert Harendt, Hutthurm, DE;
Inventors:
Lars Markwort, Haimhausen, DE;
Rajeshwar Chhibber, San Jose, CA (US);
Klaus Eckerl, Hutthurm, DE;
Norbert Harendt, Hutthurm, DE;
Assignee:
Nanda Technologies GmbH, Unterschleissheim, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 21/00 (2006.01); G06K 9/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A wafer inspection system has a bright field imaging beam path and a dark field imaging beam path to obtain bright field images and dark field images of a full 300 mm wafer. The optical system provides for telecentric imaging and has low optical aberrations. The bright field and dark field beam paths are folded such that the system can be integrated to occupy a low volume with a small foot print.