The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 06, 2011
Filed:
Oct. 05, 2007
Sang Hwan Cha, Seoul, KR;
Soo Hoa Jeong, Seoul, KR;
Sang Hwan Cha, Seoul, KR;
Soo Hoa Jeong, Seoul, KR;
LG Electronics Inc., Seoul, KR;
Abstract
The present invention relates to a maskless exposure apparatus and a method of manufacturing a substrate for a display using the same. In the present invention, a substrateis disposed on a scan stagethat can be moved in horizontal and vertical directions. Meanwhile, an optical unitfor generating light available for exposure is disposed above the substrate. Light that has passed though the optical unitis transferred to a DMD unit. The DMD unitis provided with DMDsfor selectively reflecting the light to form a pattern on the substrate. The DMDsare arranged in a plurality of rows in such a manner that DMDsin the same row are spaced apart by a predetermined distance from each other and DMDsin different rows partially overlap with each other at one end portions thereof. Thus, when the DMDsscan the substrate, scan marksare produced discontinuously in two straight lines. According to the present invention constructed as above, the scan marks are produced discontinuously on the substrate during exposure of the substrate, so that a user cannot recognize the presence of the scan marks when watching a display.