The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 06, 2011
Filed:
Jun. 29, 2009
Doug H. Lee, Poughquag, NY (US);
Erik P. Geiss, Wappingers Falls, NY (US);
Doug H. Lee, Poughquag, NY (US);
Erik P. Geiss, Wappingers Falls, NY (US);
GLOBALFOUNDRIES Inc., Grand Cayman, KY;
Abstract
Small feature patterning is accomplished using a multilayer hard mask (HM). Embodiments include sequentially forming a first HM layer and a multilayer HM layer over a substrate, the multilayer HM layer comprising sublayers, etching the multilayer HM layer to form a first opening having an upper first opening with sides converging to a lower second opening and a second opening with substantially parallel sides and an opening substantially corresponding to the lower second opening of the first opening, etching through the second opening to form a corresponding opening in the first HM layer, and etching the substrate through the corresponding opening in the first HM layer.