The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 06, 2011
Filed:
Dec. 30, 2005
Eric Fleury, Seoul, KR;
Jayaraj Jayamani, Seoul, KR;
Ki-bae Kim, Seoul, KR;
Mee-soon Lee, Legal Representative, Seoul, KR;
Hyun-kwang Seok, Seoul, KR;
Yu-chan Kim, Seoul, KR;
Kwang-youn Kim, Seoul, KR;
Dohyang Kim, Seoul, KR;
Eric Fleury, Seoul, KR;
Jayaraj Jayamani, Seoul, KR;
Ki-bae Kim, Seoul, KR;
Mee-soon Lee, legal representative, Seoul, KR;
Hyun-kwang Seok, Seoul, KR;
Yu-chan Kim, Seoul, KR;
Kwang-youn Kim, Seoul, KR;
Dohyang Kim, Seoul, KR;
Korea Institute of Science and Technology, Hawolgok-dong, Seongbuk-gu, Seoul, KR;
Abstract
The present invention relates to an amorphous alloy and a method for manufacturing thereof. The amorphous alloy according to the present invention includes has a chemical formula of Feioo-a-b-c-d-e-f-gCraMobCcBaYeMflg. Here, the M is at least one selected from a group consisting of Al, Co, N1 and Ni, and the I is at least one selected from a group consisting of Mn, P, S, and O as impurities. The a, b, c, d, e, f, and g are satisfied with the compositions of 16.0 wt %≦a<22.0 wt %, 15.0 wt %<b≦27.0 wt %, 2.0 wt %≦c<3.5 wt %, 1.0 wt %<d≦1.5 wt %, 1.0 wt %<e≦3.5 wt %, 0.25 wt %<f≦3.0 wt %, and 0.01 wt %≦g<0.5 wt %, respectively.