The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 06, 2011
Filed:
Nov. 17, 2004
Robert E. Fontana, Jr., Santa Jose, CA (US);
Neil Leslie Robertson, Palo Alto, CA (US);
Huey-ming Tzeng, Santa Jose, CA (US);
Robert E. Fontana, Jr., Santa Jose, CA (US);
Neil Leslie Robertson, Palo Alto, CA (US);
Huey-Ming Tzeng, Santa Jose, CA (US);
Hitachi Global Storage Technologies, Netherland B.V., Amsterdam, NL;
Abstract
An apparatus and method for lapping and fabricating a read/write head is described. The lapping method includes performing a first lapping process on a structure having the read/write head fabricated therein. The first lapping process is for reducing a first resistive region. The first resistive region is located proximal to a surface of the structure. The first lapping process is for achieving a first lapping benchmark. The lapping method further includes performing a second lapping process on a second resistive region. The second lapping process laps at a rate lesser than the first lapping process. The second lapping process is for achieving a second lapping benchmark. The second resistive region is interposed between the first resistive region and the read/write head. The second resistive region has a different resistive value than the second resistive region.