The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 29, 2011
Filed:
May. 18, 2007
Katsuhiro Takushima, Tokyo, JP;
Takashi Yasui, Osaka, JP;
Katsuhiro Takushima, Tokyo, JP;
Takashi Yasui, Osaka, JP;
Hoya Corporation, Tokyo, JP;
Matsushita Electric Industrial Co., Ltd., Osaka, JP;
Abstract
To provide a photomask capable of preventing a foreign matter generation in using the photomask, and an exposure method using this photomask. The photomask includes a transparent substrate; a transfer patternformed in a main regionof a center portion of the transparent substrate; a light-shading band regionprovided adjacent to the main regionin the outer peripheral region of the main region; and a pellicleformed by adhering a pellicle filmto a pellicle frameby an adhesive, wherein this pellicleis adhered onto a light-shading regionconsisting of a light-shading film formed in the outer peripheral region of the main region, through an adhesive