The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 29, 2011
Filed:
Nov. 16, 2007
Toshiyuki Sawada, Himeji, JP;
Akihiko Yanagitani, Himeji, JP;
Ryoji Hayashi, Himeji, JP;
Yoshikazu Aikawa, Himeji, JP;
Toshiyuki Sawada, Himeji, JP;
Akihiko Yanagitani, Himeji, JP;
Ryoji Hayashi, Himeji, JP;
Yoshikazu Aikawa, Himeji, JP;
Sanyo Special Steel Co., Ltd., Hyogo-Ken, JP;
Abstract
A (CoFe)Zr/Nb/Ta/Hf based target material is provided which is capable of achieving a high sputtering efficiency and a high sputtering effect by increasing the leakage magnetic flux in the magnetron sputtering, and a method for producing the target material. This target material is made of an Fe—Co based alloy comprising not less than 80 atomic % in total of Fe and Co having an Fe:Co atomic ratio of 80:20 to 0:100, and less than 20 atomic % of one or more selected from the group consisting of Zr, Hf, Nb and Ta. The Fe—Co based alloy comprises a Co—Fe phase being a ferromagnetic phase, and the one or more selected from the group consisting of Zr, Hf, Nb and Ta are incorporated in solid solution form into the Co—Fe phase in a total amount of 0.5 to 2 atomic %.