The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 29, 2011
Filed:
Dec. 30, 2008
Unal Murat Guruz, San Jose, CA (US);
Edward Hin Pong Lee, San Jose, CA (US);
Vladimir Nikitin, Campbell, CA (US);
Michael Ming Hsiang Yang, Campbell, CA (US);
Yuan Yao, Fremont, CA (US);
Unal Murat Guruz, San Jose, CA (US);
Edward Hin Pong Lee, San Jose, CA (US);
Vladimir Nikitin, Campbell, CA (US);
Michael Ming Hsiang Yang, Campbell, CA (US);
Yuan Yao, Fremont, CA (US);
Hitachi Global Storage Technologies Netherlands B.V., Amsterdam, NL;
Abstract
A method for manufacturing a magnetic head for magnetic data recording, that allows a lapping termination point to be easily and accurately determined during lapping. The method includes constructing a lapping guide that has an electrically is formed to provide an abrupt change in resistance at a point where lapping should be terminated. This point of abrupt resistance change is located relative to the flare point of the write pole that the distance between the flare point and the air bearing surface can be accurately maintained. This abrupt resistance change also makes it possible to monitor both a stripe height defining rough lapping and an angled kiss lapping process using a single measurement channel.