The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 22, 2011

Filed:

Apr. 01, 2004
Applicants:

Heung-lyul Cho, Gyeonggi-Do, KR;

Soon-sung Yoo, Gyeonggi-Do, KR;

Young-gyoung Chang, Gyeonggi-Do, KR;

Myoung-kee Baek, Gyeonggi-Do, KR;

Kwon-shik Park, Seoul, KR;

Inventors:

Heung-Lyul Cho, Gyeonggi-Do, KR;

Soon-Sung Yoo, Gyeonggi-Do, KR;

Young-Gyoung Chang, Gyeonggi-Do, KR;

Myoung-Kee Baek, Gyeonggi-Do, KR;

Kwon-Shik Park, Seoul, KR;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02F 1/13 (2006.01); G02F 1/136 (2006.01); G02F 1/1333 (2006.01); G02F 1/1337 (2006.01); G02F 1/1343 (2006.01); H01L 27/14 (2006.01); H01L 29/04 (2006.01); H01L 29/10 (2006.01); H01L 29/15 (2006.01); H01L 31/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A fabrication method of a liquid crystal display device uses a printing method which forms a pattern of a wider effective line width such as a gate line, a data line, a passivation layer, a pixel electrode, etc. constituting an LCD device. The inventive lithography process uses a mask that is applied at the time of forming a channel region having a narrow effective line width. Accordingly, the amount of resist used may be reduced, and the fabrication process can be simplified. This printing method can be used to fabricate a color filter substrate of an LCD device.


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