The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 22, 2011

Filed:

Dec. 30, 2008
Applicants:

Jae-geun OH, Icheon-si, KR;

Jin-ku Lee, Icheon-si, KR;

Min-ae Ju, Icheon-si, KR;

Inventors:

Jae-Geun Oh, Icheon-si, KR;

Jin-Ku Lee, Icheon-si, KR;

Min-Ae Ju, Icheon-si, KR;

Assignee:

Hynix Semiconductor Inc., Icheon-si, Gyeonggi-do, KR;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 29/78 (2006.01); H01L 21/425 (2006.01);
U.S. Cl.
CPC ...
Abstract

A gate of a semiconductor device includes a substrate, and a polysilicon layer over the substrate, wherein the polysilicon layer is doped with first conductive type impurities having a concentration that decreases when receding from the substrate and counter-doped with second conductive type impurities having a concentration that increases when receding from the substrate.


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