The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 22, 2011
Filed:
Mar. 26, 2009
Daigo Ichinose, Kanagawa, JP;
Tadashi Iguchi, Kanagawa, JP;
Daigo Ichinose, Kanagawa, JP;
Tadashi Iguchi, Kanagawa, JP;
Kabushiki Kaisha Toshiba, Tokyo, JP;
Abstract
A method of fabricating a semiconductor device according to one embodiment includes: forming a core material on a workpiece; forming a coating film comprising an amorphous material so as to cover an upper surface and side faces of the core material; crystallizing the coating film by applying heat treatment; forming a sidewall mask by removing the crystallized coating film while leaving a portion thereof located on the side faces of the core material; removing the core material after forming the sidewall mask; and etching the workpiece using the sidewall mask as a mask after removing the core material.