The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 22, 2011

Filed:

Oct. 18, 2005
Applicants:

Konrad Faulstich, Fremont, CA (US);

Aldrich N. K. Lau, Palo Alto, CA (US);

Debjyoti Banerjee, College Station, TX (US);

Umberto Ulmanella, Foster City, CA (US);

Jun Xie, Pasadena, CA (US);

Inventors:

Konrad Faulstich, Fremont, CA (US);

Aldrich N. K. Lau, Palo Alto, CA (US);

Debjyoti Banerjee, College Station, TX (US);

Umberto Ulmanella, Foster City, CA (US);

Jun Xie, Pasadena, CA (US);

Assignee:

Applied Biosystems, LLC, Carlsbad, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B01L 3/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A fluid processing device is provided that includes a substrate, a plurality of fluid retainment regions formed in or on the substrate, and a barrier at least partially separating two or more of the fluid retainment regions. The barrier includes a mixture of a sequestering material and a reaction component. The reaction component can be at least one of a reactant, a reagent, a catalyst, an initiator, a promoter, a cofactor, an enzyme, a salt, or a combination thereof. The sequestering material can be a porous material, a dissolvable material, or both.


Find Patent Forward Citations

Loading…