The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 22, 2011
Filed:
Mar. 30, 2009
Masaki Ito, Suwa, JP;
Shotaro Watanabe, Chino, JP;
Masaki Ito, Suwa, JP;
Shotaro Watanabe, Chino, JP;
Seiko Epson Corporation, Tokyo, JP;
Abstract
There is provided a method of manufacturing an organic EL panel by using a mask that includes a blocking portion blocking incoming particles and a plurality of opening portions through which the incoming particles can pass. The method includes forming a first light emitting part corresponding to a first color on a substrate by using a first mask, forming a first electrode that is overlapped with the first light emitting part by using the first mask, forming a second light emitting part corresponding to a second color on the substrate next to the first light emitting part so as to cover at least a part of the first electrode by using a second mask, forming a third light emitting part corresponding to a third color on the substrate in a position for facing the second light emitting part with the first electrode interposed therebetween in the plan view so as to cover at least a part of the first electrode or the second light emitting part, by using a third mask, forming a second electrode in an area corresponding to the second light emitting part and the third light emitting part by using a fourth mask, and removing a material that is deposited on the first electrode and the second electrode by using the first electrode and the second electrode as a mask.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile