The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 15, 2011
Filed:
Sep. 23, 2009
Eloy R. Wouters, San Jose, CA (US);
Christopher Mullen, Menlo Park, CA (US);
Maurizio A. Splendore, Walnut Creek, CA (US);
R. Paul Atherton, San Jose, CA (US);
Eloy R. Wouters, San Jose, CA (US);
Christopher Mullen, Menlo Park, CA (US);
Maurizio A. Splendore, Walnut Creek, CA (US);
R. Paul Atherton, San Jose, CA (US);
Thermo Finnigan LLC, San Jose, CA (US);
Abstract
A system for preventing backflow as part of an ion source arrangement is introduced. Such a system incorporates a novel continuous flow guide within a source, such as an API ion source. In the spray direction, the cross-sectional area that defines the first portion of the internal volume initially decreases in a convergent-like manner and thereafter increases in a divergent-like manner towards the exit opening of the source housing. Such a flow guide has been designed as an integral part of an ion source housing to provide for an optimal unidirectional flow past a sampling orifice of a mass spectrometer inlet. Accordingly, the novel design of the present invention prevents recirculation and thus minimizes carryover, chemical noise, and source turbulence and as an added benefit, enables a user to easily clean such a system during maintenance.