The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 15, 2011

Filed:

Dec. 15, 2008
Applicants:

Yeshwanth Narendar, Westford, MA (US);

Richard F. Buckley, Shrewsbury, MA (US);

Inventors:

Yeshwanth Narendar, Westford, MA (US);

Richard F. Buckley, Shrewsbury, MA (US);

Assignee:

CoorsTek, Inc., Golden, CO (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/311 (2006.01);
U.S. Cl.
CPC ...
Abstract

A semiconductor processing component has an outer surface portion comprised of silicon carbide, the outer surface portion having a skin impurity level and a bulk impurity level. The skin impurity level is average impurity level from 0 nm to 100 nm of depth into the outer surface portion, the bulk impurity level is measured at a depth of at least 3 microns into the outer surface portion, and the skin impurity level is not greater than 80% of the bulk impurity level.


Find Patent Forward Citations

Narendar, Yeshwanth. (2011). Method for treating semiconductor processing components and components formed thereby (U.S. Patent No. 8058174). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8058174

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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