The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 15, 2011
Filed:
Feb. 25, 2009
Applicants:
Katsuhiro Sato, Yokohama, JP;
Takahito Nakajima, Yokkaichi, JP;
Inventors:
Katsuhiro Sato, Yokohama, JP;
Takahito Nakajima, Yokkaichi, JP;
Assignee:
Kabushiki Kaisha Toshiba, Tokyo, JP;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/76 (2006.01);
U.S. Cl.
CPC ...
Abstract
A polysilazane perhydride solution, prepared by dispensing polysilazane perhydride in a solvent containing carbon, is applied on a semiconductor substrate (), thereby forming a coated film (), which is heated, volatilizing solvent therein, thereby forming a polysilazane film (), which is chemical-treated, so the polysilazane film () is changed to a silicon dioxide film ().
Sato, Katsuhiro. (2011). Manufacturing method for semiconductor devices (U.S. Patent No. 8058139). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8058139
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile